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Book Description

This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field.

Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Table of Contents

  1. Cover image
  2. Title page
  3. Table of Contents
  4. Copyright
  5. Foreword to First Edition
  6. Preface
  7. Acknowledgments
  8. Historical Perspective
  9. Chapter 1: A Review of Materials Science
  10. Chapter 2: Vacuum Science and Technology
  11. Chapter 3: Thin-Film Evaporation Processes
  12. Chapter 4: Discharges, Plasmas, and Ion–Surface Interactions
  13. Chapter 5: Plasma and Ion Beam Processing of Thin Films
  14. Chapter 6: Chemical Vapor Deposition
  15. Chapter 7: Substrate Surfaces and Thin-Film Nucleation
  16. Chapter 8: Epitaxy
  17. Chapter 9: Film Structure
  18. Chapter 10: Characterization of Thin Films and Surfaces
  19. Chapter 11: Interdiffusion, Reactions, and Transformations in Thin Films
  20. Chapter 12: Mechanical Properties of Thin Films
  21. Appendix
  22. Index
44.192.15.251