Index

A

accuracy

adherence

adhesion

adjustment

atomic force microscopy (AFM)

algorithm

aspect ratio

average

azobenzene

B

bar

C

capillary

correction

D

deconvolution

de-embossing

deformation

demolding

diffraction

distribution

E

edge effect

elastic

electron

transistor

ellipsometry

evanescent wave

F

flexible

flow

force

fracture

friction

G

goniometry

I

indentation

interaction

interface

L

library

local

M

measurement

metrology

MMFE

N

nano-oxidation

negative resist

O

optical

organo-metallic

P

parameter

PDMS

photon

photosensitive resist

plasmonic

point

polarization

polymer

polymerization

positive resist

pressing

profile

proximity

Q

quantum devices

R

rays

regression

reproducibility

resolution

roughness

S

scatterometry

sensitivity

silane

silicon

silver

statistical

STM

surface energy

T

thermorepeated

threshold

topographical

treatment

U

uncertainty

UV lithography

V

variance

viscosity

volume

X

X-rays