- Cover image
- Title page
- Table of Contents
- Copyright
- Contributor contact details
- Praface
- Part I: Theory of thin film growth
- Chapter 1: Measuring nucleation and growth processes in thin films
- Abstract:
- 1.1 Introduction
- 1.2 Basic theory of epitaxial growth
- 1.3 Observation method of atomic steps
- 1.4 Two-dimensional-island nucleation and step-flow growth modes
- 1.5 The motion of atomic steps on a growing and evaporating Si(111) surface
- 1.6 Morphological instability of atomic steps
- 1.7 Conclusion and future trends
- 1.9 Appendix
- Chapter 2: Quantum electronic stability of atomically uniform films
- Abstract:
- 2.1 Introduction
- 2.2 Electronic growth
- 2.3 Angle-resolved photoemission spectroscopy
- 2.4 Atomically uniform films
- 2.5 Quantum thermal stability of thin films
- 2.6 General principles of film stability and nanostructure development
- 2.7 Beyond the particle-in-a-box
- 2.8 Future trends
- 2.9 Acknowledgments
- Chapter 3: Phase-field modeling of thin film growth
- Chapter 4: Analysing surface roughness evolution in thin films
- Chapter 5: Modelling thin film deposition processes based on real-time observation
- Abstract:
- 5.1 Introduction: time resolved surface science
- 5.2 Basics of growth and relevant length of and timescales for in-situ observation of film deposition
- 5.3 Experimental techniques for real-time and in-situ studies
- 5.4 Experimental case studies
- 5.5 Future trends
- 5.6 Sources of further information and advice
- Chapter 1: Measuring nucleation and growth processes in thin films
- Part II: Techniques of thin film growth
- Chapter 6: Silicon nanostructured films grown on templated surfaces by oblique angle deposition
- Abstract:
- 6.1 Introduction
- 6.2 Preparation of templated surface for oblique angle deposition
- 6.3 Fan-out on templated surface with normal incident flux
- 6.4 Fan-out growth on templated surfaces with oblique angle incident flux
- 6.5 Control of fan-out growth with substrate rotations
- 6.6 Applications and future trends
- Chapter 7: Phase transitions in colloidal crystal thin films
- Chapter 8: Thin film growth for thermally unstable noble-metal nitrides by reactive magnetron sputtering
- Chapter 9: Growth of graphene layers for thin films
- Chapter 10: Epitaxial growth of graphene thin films on single crystal metal surfaces
- Chapter 11: Electronic properties and adsorption behaviour of thin films with polar character
- Chapter 12: Polarity controlled epitaxy of III-nitrides and ZnO by molecular beam epitaxy
- Chapter 13: Understanding substrate plasticity and buckling of thin films
- Chapter 14: Controlled buckling of thin films on compliant substrates for stretchable electronics
- Chapter 15: The electrocaloric effect (ECE) in ferroelectric polymer films
- Abstract:
- 15.1 Introduction
- 15.2 Thermodynamic considerations on materials with large electrocaloric effect (ECE)
- 15.3 Previous investigations on electrocaloric effect (ECE) in polar materials
- 15.4 Large electrocaloric effect (ECE) in ferroelectric polymer films
- 15.5 Future trends
- 15.6 Conclusion
- 15.7 Acknowledgements
- Chapter 16: Network behavior in thin films and nanostructure growth dynamics
- Chapter 6: Silicon nanostructured films grown on templated surfaces by oblique angle deposition
- Index
Part II
Techniques of thin film growth
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